This lecture treats the major methods for thin film growth, i.e., evaporation, sputtering, chemical vapour deposition, and plasma enhanced chemical vapour deposition. Some shorter chapters deal with atomic layer deposition and pulsed laser deposition. The basic physics, thermodynamics, and chemistry will be introduced as needed for the understanding of the methods. Heterogeneous nucleation and growth of thin films is treated for the general case. For some cases, the course presents some elements of microstructural evolution as a function of process parameters, such as temperature and ion bombardment. The industrial relevance is highlighted in the introduction. Application examples are given in relation to the strength and weakness of the various methods.
- Professor: Paul Muralt
