MICRO-428 Metrology


Lecturer(s) :

Bruschini Claudio
Charbon Edoardo
Fantner Georg
Vardi Ilan

Language:

English

Summary

The course deals with the concept of measuring in different domains, particularly in the electrical, optical, and microscale domains. The concept of precision, accuracy, and resolution will be introduced early in the course with an embedded course on statistics, which provide the basics required to understand how proper measurements ought to be performed. Subsequently, the course will introduce electrical, optical, and mechanical metrology techniques dealing with intrinsic and extrinsic limitations of the measurement. The course will end with a perspective on quantum measurements, which could trigger the ultimate revolution in metrology. Homework will be used as a means to practice the concepts learnt in class.

Content

The topics covered by the course are summarized as follows:

  • Feb. 17, 2020
Introduction class (W 1.1)
Classical metrology, current definitions (kg, C, A, V), Système International (W 1.2)
HW Series 1 (W 1.3)

  • Feb. 24 and Mar. 2, 2020

Basic statistics: random variables, random processes, probability distribution functions, moments, statistical independence, correlation, wide-sense stationary processes, ergodicity, Gaussian and Poisson processes, Central Limit Theorem, time series analysis, elements of estimation theory. Concepts of accuracy, precision, and resolution of a measurement 

(W 2 – W 3) - HW Series 2, 3 (W 2.3, W 3.3)

  • Mar. 9, Mar. 16, and Mar. 23 (first hour), 2020

Electrical metrology: currents, voltages, charges, noise sources (1/f, RTS, shot, thermal, KT/C), averaging techniques, accuracy, precision, error estimation, time estimation. Tools for electrical metrology (lock-in, PLL, DLL, network analyser, etc.). Time-resolved imaging applications.

(W 4 – W 5 – W 6.1) - HW Series 4, 5 (W 4.3, W 5.3)

  • Mar. 23 (second and third hour), 2020
Optical microscopy: how an image is formed on a sensor (W 6.2-W 6.3)

  • Mar. 30 and Apr. 6, 2020

Optical imaging: photons & wavelengths, intensity, photon flux, image sensor parameters (optical gain, quantum efficiency, PRNU, etc.). Tools for optical metrology. Optical system evaluation (aberration, concentration factors, refraction, diffraction, vignetting, Abbe’s limit). 

(W 7 – W 8) - HW Series 7, 8 (W 7.3, W 8.3)

  • Apr. 20, 2020

Time, including atomic clock

(W 9) HW Series 9  (W 9.3)

  • Apr. 27 and May 4, 2020

Microscale metrology: SPM/AFM, SEM, interferometry, measurement of micro/nanoscale   forces and distances, nanomechanical properties, fundamental issues of nanomechanical metrology instruments.

(W 10 – W 11) - HW Series 10, 11 (W 10.3, W 11.3) – probably will be suppressed

  • May 11, 2020

Redefinition of SI, METAS.  (W 12)

  • May 18 and May 25, 2020

Quantum perspective: the f-U-I triangle, measuring randomness, photon counting, single-electron detection, qubit metrology, micro-temperature measurements and cryogenic limits.  

(W 13 – W 14) - HW Series 13, 14 (W 13.3, W 14.3)

Keywords

Accuracy, precision, resolution, reproducibility, reliability, fidelity of the measurement

Learning Prerequisites

  • Required courses

Basic mathematics/physics

  • Recommended courses

Design of experiments

Learning Outcomes

By the end of the course, the student must be able to develop measurement setups that yield reproducible results. He/she should be able to analyze the accuracy and precision of a measurement for a certain resolution. Ultimately, students will learn how to interpret the quality of data from measurements.


Assessment methods

Self-assessment (ungraded homework, exercise session presence verified); final exam during exam sessions.

Resources

  • Notes/Handbook

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