Lecturer(s) :
Language:
English
Summary
The course deals with the concept of measuring in different domains, particularly in the electrical, optical, and microscale domains. The concept of precision, accuracy, and resolution will be introduced early in the course with an embedded course on statistics, which provide the basics required to understand how proper measurements ought to be performed. Subsequently, the course will introduce electrical, optical, and mechanical metrology techniques dealing with intrinsic and extrinsic limitations of the measurement. The course will end with a perspective on quantum measurements, which could trigger the ultimate revolution in metrology. Homework will be used as a means to practice the concepts learnt in class.
Content
The topics covered by the course are summarized as follows:
- Feb. 17, 2020
- Feb. 24 and Mar. 2, 2020
Basic statistics: random variables, random processes, probability distribution functions, moments, statistical independence, correlation, wide-sense stationary processes, ergodicity, Gaussian and Poisson processes, Central Limit Theorem, time series analysis, elements of estimation theory. Concepts of accuracy, precision, and resolution of a measurement
(W 2 – W 3) - HW Series 2,
3 (W 2.3, W 3.3)
- Mar. 9, Mar. 16, and Mar. 23 (first hour), 2020
Electrical metrology: currents, voltages, charges, noise sources (1/f, RTS, shot, thermal, KT/C), averaging techniques, accuracy, precision, error estimation, time estimation. Tools for electrical metrology (lock-in, PLL, DLL, network analyser, etc.). Time-resolved imaging applications.
(W 4 – W 5 – W 6.1) - HW Series 4, 5 (W 4.3, W 5.3)
- Mar. 23 (second and third hour), 2020
- Mar. 30 and Apr. 6, 2020
Optical imaging: photons & wavelengths, intensity, photon flux, image sensor parameters (optical gain, quantum efficiency, PRNU, etc.). Tools for optical metrology. Optical system evaluation (aberration, concentration factors, refraction, diffraction, vignetting, Abbe’s limit).
(W 7 – W 8) - HW Series 7, 8 (W 7.3, W 8.3)
- Apr. 20, 2020
Time, including atomic clock
(W 9) HW Series 9 (W 9.3)
- Apr. 27 and May 4, 2020
Microscale metrology: SPM/AFM, SEM, interferometry, measurement of micro/nanoscale forces and distances, nanomechanical properties, fundamental issues of nanomechanical metrology instruments.
(W 10 – W 11) - HW Series 10, 11 (W 10.3, W 11.3) – probably will be suppressed
- May 11, 2020
Redefinition of SI, METAS. (W 12)
- May 18 and May 25, 2020
Quantum perspective: the f-U-I triangle, measuring randomness, photon counting, single-electron detection, qubit metrology, micro-temperature measurements and cryogenic limits.
(W 13 – W 14) - HW Series 13, 14 (W 13.3, W 14.3)
Keywords
Accuracy, precision, resolution, reproducibility, reliability, fidelity of the measurement
Learning Prerequisites
Required courses
Basic mathematics/physics
Recommended courses
Design of experiments
Learning Outcomes
By the end of the course, the student must be able to develop measurement setups that yield reproducible results. He/she should be able to analyze the accuracy and precision of a measurement for a certain resolution. Ultimately, students will learn how to interpret the quality of data from measurements.
Assessment methods
Self-assessment (ungraded homework, exercise session presence verified); final exam during exam sessions.
Resources
Notes/Handbook
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- Professor: Claudio Bruschini
- Professor: Edoardo Charbon
- Professor: Georg Fantner
- Professor: Ilan Vardi
- Teacher: Simone Frasca
